国際会議

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11th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics(TOEO11)

-Oct.2019,Nara,Japan-

■Fabrication of Stoichiometry Controlled YbFe2O4 Epitaxial Thin Films Using PLD Method Controlled YbFe2O4 Epitaxial Thin Films Using PLD Method               J.Tanaka

■Domain Structure Imaging in P(VDF-TrFE) Films using Direct Piezoelectric Response Microscopy         I. Kanagawa

■Investigation of The Epitaxial Growth of PZT Thin Films on Si Substrates using TiN Buffer Layer          M. Murase

■Control of Epitaxial Orientation and Crystal Structure of HfO2:Y/Si Films by Oxygen Partial Pressure    Y. Saho

■Growth of Highly-Resistive ZnO Films Fabricated using Non-Equilibrium Plasma Generated Near Atmospheric Pressure       S. Takarae

■Effects of bottom electrodes on the epitaxial growth of YbFe2O4 films       K. Shimamoto