● Electron transport properties of Zn_0.88Mn_0.12O/ZnO modulation-doped heterostructures
K. Masuko, A. Ashida, T. Yoshimura, N. Fujimura
Journal of Vacuum Science & Technology B, 27(2009)1760-1764
http://dx.doi.org/+10.1116/1.3093916

● Contribution of s-d exchange interaction to magnetoresistance of ZnO-based heterostructures with a magnetic barrier
K. Masuko, A. Ashida, T. Yoshimura, N. Fujimura
Physical Review B, 80(2009) 125313
http://prb.aps.org/abstract/PRB/v80/i12/e125313

● Polarization switching behavior of YMnO₃ thin film at around magnetic phase transition temperature
K. Maeda, T. Yoshimura, N. Fujimura
Japanese Journal of Applied Physics, 48(2009) 09KB05
http://jjap.jsap.jp/link?JJAP/48/09KB05/

● Effects of Mg doping on structural, optical, and electrical properties of CuScO₂(0001) epitaxial films
Y. Kakehi, K. Satoh, T. Yoshimura, A. Ashida, N. Fujimura
Vacuum Surface Engineering, Surface Instrumentation & Vacuum Technology, 84(2009) 618-621
http://dx.doi.org/10.1016/j.vacuum.2009.06.023

● Magnetic properties of uniformly Ce-doped Si thin films with n-type conduction
T. Terao, K. Fujii, D. Shindo, T. Yoshimura, N.Fujimura
Japanese Journal of Applied Physics, 48 (2009) 033003
http://jjap.jsap.jp/link?JJAP/48/033003/

● Amorphous carbon film deposition for hydrogen barrier in FeRAM integration by radio frequency plasma chemical vapor deposition
T. Saito, K. Izumi, Y. Hirota, N. Okamoro, K. Kondo, T. Yoshimura, N. Fujimura
Electrochemical Society Transactions, 25(2009) 693-698
http://ecst.ecsdl.org/content/25/8/693

● Optical and electrical properties of CuScO₂ epitaxial films prepared by combining two-step deposition and post-annealing techniques
Y. Kakehi, K. Satoh, T. Yotsuya, K. Masuko, T. Yoshimura, A. Ashida, N. Fujimura
Journal of Crystal Growth, 311(2009)  1117-1122
http://dx.doi.org/10.1016/j.jcrysgro.2008.11.060

● Spin-phonon coupling in multiferroic YbMnO₃ studied by Raman scattering
H. Fukumura, N. Hasuike, H. Harima , K. Kisoda , K. Fukae , T. Yoshimura , N. Fujimura
JOURNAL OF PHYSICS-CONDENSED MATTER, 21 (2009) 064218
http://iopscience.iop.org/0953-8984/21/6/064218/

●Amorphous Carbon Film Deposition for Hydrogen Barrier in FeRAM Integration by Radio Frequency Plasma Chemical Vapor Deposition Method
Takeyasu Saito, Kaname Izumi, Yuichiro Hirota, Naoki Okamoto, Kazuo Kondo,Takeshi Yoshimura and Norifumi Fujimura
216th ECS Transactions, 25 (2009)693-698
http://ecst.ecsdl.org/content/25/8/693.abstract

Commentary, review

●ZnMnO/ZnOヘテロ構造の作製とその磁気輸送特性
(Fabrication and magneto-transport properties of ZnMnO/ZnO heterostructures)
Keiichiro Masuko,Atsushi Ashida,Takeshi Yoshimura and Norifumi Fujimura
多元系機能材料研究会 平成２１年度活動報告書.