● Effect of plasma-induced damage on interfacial reactions of titanium thin films on silicon surface
T. Yamaguchi, N. Fujimura, A. Hama, H. Niko and T. Ito
Applied Physics Letters, 76, 17(2000) 2358-2360
http://scitation.aip.org/content/aip/journal/apl/76/17/10.1063/1.126345

● Characterization of ferroelectricity in metal/ferroelectric/insulator/semiconductor structure by pulsed C-V measurement; ferroelectricity in YMnO₃/Y₂O₃/Si structure
T. Yoshimura, N. Fujimura and T. Ito
Journal of Applied Physics, 87, 7(2000)3444-3449
http://scitation.aip.org/content/aip/journal/jap/87/7/10.1063/1.372364

● Improvement Y₂O₃/Si interface for FeRAM application
D. Ito, T. Yoshimura, N. Fujimura and T. Ito
Applied Surface Science, 159-160(2000) 138-142
http://www.sciencedirect.com/science/article/pii/S0169433200000854

● Influence of reactive ion etching damage on the schottky barrier hight of Ti/p-Si interface.
N. Fujimura, T. Yamaguchi, H.Kato, and T. Ito
Applied Surface Science; 159-160(2000)186-190
http://www.sciencedirect.com/science/article/pii/S0169433200000696

● 廃棄物処理マルチスメルターのシミュレーション
張　興和、高橋　礼二郎、八木　順一郎、大西　忠一、久米　正一
高温学会誌, 26(2000) 306-315

● Initial stage of thin film growth of pulsed laser deposited YMnO₃
Daisuke Ito, Norifumi Fujimura, Taichiro Ito
Jpn. J. Appl. Phys., 39(2000) 5525
http://jjap.jsap.jp/link?JJAP/39/5525/

● Effects of excess Si, excess Mg and Fe on precipitation in 6061 aluminum　alloys during recycling process.
A. Yamamoto, H.Tsubakino, A. Suehiro, A. Watanabe, T. Ohnishi and M. Kanno
Proc. of 7th Intern. Conf. on Aluminum Alloys (2000) 1-6
https://www.researchgate.net/publication/250338493

● Small-sized blust furnace system for waste as resources.
K. Uehara, K. Miyatake, T. Ohnishi, S. Kume and H. Harada
Proc. of Intern. Conf. on Steel and Society (2000)  1-6

● Precipitation in 6061 aluminum alloys containing intermetallic inclusion.
A. Yamamoto, H. Tsubakino, A. Suehiro, A. Watanabe, A. Noguchi, T. Ohnishi and M. Kanno
Proc. on 2nd Intern. Sym. on Designibg, Processing and Properties of Advanced Engineering Materials (2000)  1-8

● Evaluation of ferroelectricity in MFIS type Capacitor using pulsed C-V measurements
N. Fujimura, T. Yoshimura and T. Ito
Materials Research Soc. Symposium Proceedings, 596(2000)407-412
http://journals.cambridge.org/action/displayAbstract?fromPage=online&aid=8053923&fulltextType=RA&fileId=S1946427400203710

●Origin of Leakage Current of YMnO₃ Thin Films Prepared by the Sol-Gel Method
Hiroya Kitahara, Kiyoharu Tadanaga, Tsutomu Minami, Norifumi Fujimura, Taichiro Ito
Materials Research Soc. Symposium Proceedings, 596(2000)481-486
http://journals.cambridge.org/action/displayAbstract?fromPage=online&aid=8054098&fulltextType=RA&fileId=S1946427400203801

● Si:Ce薄膜における新規な磁気輸送現象
藤村　紀文、横田　壮司、森永　泰規、伊藤　太一郎
「スピン制御による半導体超構造の新展開」研究成果論文集(2000) 34-37

● Y₂O₃/Si界面の電気的評価とその強誘電体メモリーへの応用
藤村　紀文、伊藤　大輔、伊藤　太一郎
極薄シリコン酸化膜の形成・評価・信頼性シンポジウム講演論文集(2000)105-108

●Preparation and Ferroelectric Properties of YMnO₃ Thin Films with c-Axis Preferred Orientation by the Sol-Gel Method
H. Kitahata, K.Tadanaga, T.Minami, N.Fujimura
Journal of Sol-Gel Science and Technology 19(2000) 589–593
http://link.springer.com/article/10.1023%2FA%3A1008761327562

●Effect of Carrier Concentration on the Magnetic Behavior of Ferroelectric YMnO₃ Ceramics and Thin Films
N.Fujimura ,S.Yamamori, A.Nakamoto, D.Ito, T.Yokota, T.Ito
Proceedings of the 2000 12th IEEE International Symposium on(Vol.2)(2000)
http://ieeexplore.ieee.org/xpl/freeabs_all.jsp?arnumber=942398&abstractAccess=no&userType=inst

●Magnetic and magneto-transport properties of Ce doped Si thin films
N.Fujimura, T.Yokota, Y.Morinaga, T.Ito
Proceedings 25th International Conference of Physics Semicond.Osaka2000(2000)1467-1488